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Proceedings Paper

Forward solve algorithms for optical critical dimension metrology
Author(s): P. L. Jiang; H. Chu; J. Hench; Dan Wack
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Paper Abstract

A review of selected current and new Maxwell equation solve algorithms used in critical dimension metrology is presented. We show that the standard RCWA can have serious issues under certain conditions, even in some typical scatterometry applications. We present some results showing that some of the newer algorithms we developed can significantly outperform the RCWA. The strengths and weakness of algorithms are illustrated.

Paper Details

Date Published: 24 March 2008
PDF: 7 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221O (24 March 2008); doi: 10.1117/12.773003
Show Author Affiliations
P. L. Jiang, Tokyo Electron, Ltd. (United States)
H. Chu, Tokyo Electron, Ltd. (United States)
J. Hench, KLA-Tencor (United States)
Dan Wack, KLA-Tencor (United States)

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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