Proceedings Paper
Using composite gratings for optical system characterization through scatterometry| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
Timely process characterization is crucial in Design for Manufacturing. Scatterometry as a powerful metrology tool can
be extended for optical system characterization. In this paper, we show how scatterometry can be used in conjunction
with an array of dual-pitch or dual-bar gratings to measure optical aberrations. Multiple pattern designs are presented
and compared. A linear model is used to describe the relation between aberration and measurable quantities. Firstprinciple
simulation results shows the current approach can simultaneously measure various Zernike coefficients with
accuracy ~2 mλ.
Paper Details
Date Published: 4 March 2008
PDF: 12 pages
Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251B (4 March 2008); doi: 10.1117/12.772785
Published in SPIE Proceedings Vol. 6925:
Design for Manufacturability through Design-Process Integration II
Vivek K. Singh; Michael L. Rieger, Editor(s)
PDF: 12 pages
Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251B (4 March 2008); doi: 10.1117/12.772785
Show Author Affiliations
Yu Ben, Univ. of California, Berkeley (United States)
Jing Xue, Univ. of California, Berkeley (United States)
Jing Xue, Univ. of California, Berkeley (United States)
Costas J. Spanos, Univ. of California, Berkeley (United States)
Published in SPIE Proceedings Vol. 6925:
Design for Manufacturability through Design-Process Integration II
Vivek K. Singh; Michael L. Rieger, Editor(s)
© SPIE. Terms of Use
