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Proceedings Paper

Chemical and mechanical properties of UV-cured nanoimprint resists and release layer interactions
Author(s): Frances A. Houle; Ann Fornof; Dolores C. Miller; Simone Raoux; Hoa Truong; Eva Simonyi; Christopher Jahnes; Stephen Rossnagel
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Paper Abstract

UV-curable nanoimprint resist characteristics and performance are key to controlling resist-related defects formed during template removal due to cohesive failure and strong resist-template adhesion. The debonding process is governed by both the chemical bonds that form between the template and the resist during cure, and by the structure of the resist itself which determines its elastic-plastic response under load. To gain insight to contributions from resist composition to the debonding process we examine the connection between mechanical and chemical properties of a family of methacrylate polyfunctionalized polyhedral oligomeric silsesquioxane (mPSS) containing resists to their adhesion to fluoroalkyl silane release layers. We also survey debonding of one of the mPSS formulations, an acrylate formulation and a vinyl ether formulation from as series of metal oxide and metal nitride release layers. The results show that while intrinsic storage modulus of a cured material is important, interfacial segregation of reactants in fluid resists can influence adhesive properties as well. The metal-containing release layers are shown to have generally much lower adhesion to cured resists than does a fluoroalkyl silane release layer. They present a useful alternative for template release treatments.

Paper Details

Date Published: 14 March 2008
PDF: 6 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210B (14 March 2008); doi: 10.1117/12.772591
Show Author Affiliations
Frances A. Houle, IBM Almaden Research Ctr. (United States)
Ann Fornof, IBM Almaden Research Ctr. (United States)
Dolores C. Miller, IBM Almaden Research Ctr. (United States)
Simone Raoux, IBM Almaden Research Ctr. (United States)
Hoa Truong, IBM Almaden Research Ctr. (United States)
Eva Simonyi, IBM T. J. Watson Research Ctr. (United States)
Christopher Jahnes, IBM T. J. Watson Research Ctr. (United States)
Stephen Rossnagel, IBM T. J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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