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Contrast management of 193i interferometry to be close to scanners contrast conditions
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Paper Abstract

When projected with a scanner, the latent image intensity in the photoresist has a slope that can be much lower than with an interferometer. To study finely the lithographic process and to be predictive, the Normalized image slope of 193 nm immersion interferometer built at LETI has to be controlled. The exposure latitude (EL), the Normalized Image Log Slope (NILS) and the interference contrast are closely related.

Paper Details

Date Published: 7 March 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69242G (7 March 2008); doi: 10.1117/12.772584
Show Author Affiliations
Alexandre Lagrange, CEA Leti - Minatec (France)
Philippe Bandelier, CEA Leti - Minatec (France)
Christelle Charpin, CEA Leti - Minatec (France)
Olivier Lartigue, CEA Leti - Minatec (France)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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