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Proceedings Paper

Evaluation of adamantane derivatives for chemically amplified resist: a comparison between ArF, EUV, and EB exposures
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Paper Abstract

Photoresists containing adamantane derivatives have been widely used with ArF exposure tools. However, the performance characteristics of adamantane derivatives with other optical sources, such as extreme ultraviolet (EUV) and electron beam (EB) sources, have not been well-studied. To clarify such performance characteristics for several exposure sources, we synthesized acrylic terpolymers containing adamantyl methacrylates as model photopolymers and exposed the resist samples based on these polymers to ArF, EUV and EB radiations. On the basis of the lithographic performance characteristics of these resist samples, we evaluated the performance characteristics of adamantane derivatives upon exposure to different radiations. We discuss the relationship between the chemical structures of adamantane derivatives and lithographic performance characteristics.

Paper Details

Date Published: 26 March 2008
PDF: 12 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692334 (26 March 2008); doi: 10.1117/12.772408
Show Author Affiliations
Kikuo Furukawa, Mitsubishi Gas Chemical Co., Inc. (Japan)
Shu Seki, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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