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Proceedings Paper

Pixelated phase mask as novel lithography RET
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Paper Abstract

Novel RET-Pixelated Phase Mask (PPM) is proposed as a novel Resolution Enhancement Technique (RET). PPM is made of pixels of various phases with lateral dimensions significantly smaller than the illuminating radiation wavelength. Such PPM with a singular choice of pixel dimensions acts as a mask with variable phase and transmission due to radiation scattering and attenuation on pixel features with the effective intensity and phase modulated by the pixel layout. Key properties of the pixelated phase masks, the steps for their practical realization, and the benefits to random logic products discussed. Wafer patterning performance and comparative functional yield results obtained for a 65nm node microprocessor patterned with PPM, as well as current PPM limitations are also presented.

Paper Details

Date Published: 7 March 2008
PDF: 14 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69240E (7 March 2008); doi: 10.1117/12.772116
Show Author Affiliations
Yan Borodovsky, Intel Corp. (United States)
Wen-Hao Cheng, Intel Corp. (United States)
Richard Schenker, Intel Corp. (United States)
Vivek Singh, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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