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Proceedings Paper

High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches
Author(s): Roger H. French; Hoang V. Tran; Doug J. Adelman; Nyrissa S. Rogado; Mureo Kaku; Michael Mocella; Charles Y. Chen; Eric Hendrickx; Freida Van Roey; Adam S. Bernfeld; Rebekah A. Derryberry
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Paper Abstract

We have performed high-index immersion fluid studies to define the levels of both soluble and insoluble impurities present. These studies have also revealed the importance of process materials' purity in fluid contact. Fluid interactions with resist, leading to both surface and imaging defects, can be minimized by proper resist selection. Our Active Recycle Package technology can greatly extend the useful life of both the fluid itself, as well as the final lens element.

Paper Details

Date Published: 12 March 2008
PDF: 8 pages
Proc. SPIE 6924, Optical Microlithography XXI, 692417 (12 March 2008); doi: 10.1117/12.772105
Show Author Affiliations
Roger H. French, DuPont Co. (United States)
Hoang V. Tran, DuPont Co. (United States)
Doug J. Adelman, DuPont Co. (United States)
Nyrissa S. Rogado, DuPont Co. (United States)
Mureo Kaku, DuPont K. K. (Japan)
Michael Mocella, DuPont Co. (United States)
Charles Y. Chen, DuPont-EKC (United States)
Eric Hendrickx, IMEC (Belgium)
Freida Van Roey, IMEC (Belgium)
Adam S. Bernfeld, DuPont Co. (United States)
Rebekah A. Derryberry, DuPont Co. (United States)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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