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Proceedings Paper

Recent performance results of Nikon immersion lithography tools
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Paper Abstract

Nikon's production immersion scanners, including the NSR-S609B and the NSR-S610C, have now been in the field for over 2 years. With these tools, 55 nm NAND Flash processes became the first immersion production chips in the world, and 45 nm NAND Flash process development and early production has begun. Several logic processes have also been developed on these tools. This paper discusses the technical features of Nikon's immersion tools, and their results in production.

Paper Details

Date Published: 7 March 2008
PDF: 8 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241N (7 March 2008); doi: 10.1117/12.771823
Show Author Affiliations
Andrew J. Hazelton, Nikon Corp. (Japan)
Kenichi Shiraishi, Nikon Corp. (Japan)
Shinji Wakamoto, Nikon Corp. (Japan)
Yuuki Ishii, Nikon Corp. (Japan)
Masahiko Okumura, Nikon Corp. (Japan)
Nobutaka Magome, Nikon Corp. (Japan)
Hiroyuki Suzuki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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