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Proceedings Paper

Double patterning of contact array with carbon polymer
Author(s): Woo-Yung Jung; Guee-Hwang Sim; Sang-Min Kim; Choi-Dong Kim; Sung-Min Jeon; Keunjun Kim; Sang-Wook Park; Byung-Seok Lee; Sung-Ki Park; Hoon-Hee Cho; Ji-Soo Kim
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Paper Abstract

The spacer patterning technique (SPT) is well known as one of the methods expanding the resolution limit and mainly useful for patterning line & space of memory device. Although contact array could be achieved by both spacer patterning technique and double exposure & etch technique (DEET) 1, the former would be preferable to the latter by the issues of overlay burden and resolution limit of isolated contact. The process procedure for contact array is similar to that for line & space which involves the 1st mask exposure, etch, carbon polymer deposition, the 2nd mask exposure and etch step sequentially. With SPT, it would be possible to realize contact array of 30nm half pitch including 30nm isolated contact as well as line & space of 30nm half pitch.

Paper Details

Date Published: 7 March 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69240C (7 March 2008); doi: 10.1117/12.771092
Show Author Affiliations
Woo-Yung Jung, Hynix Semiconductor Inc. (South Korea)
Guee-Hwang Sim, Hynix Semiconductor Inc. (South Korea)
Sang-Min Kim, Hynix Semiconductor Inc. (South Korea)
Choi-Dong Kim, Hynix Semiconductor Inc. (South Korea)
Sung-Min Jeon, Hynix Semiconductor Inc. (South Korea)
Keunjun Kim, Hynix Semiconductor Inc. (South Korea)
Sang-Wook Park, Hynix Semiconductor Inc. (South Korea)
Byung-Seok Lee, Hynix Semiconductor Inc. (South Korea)
Sung-Ki Park, Hynix Semiconductor Inc. (South Korea)
Hoon-Hee Cho, Lam Research Corp. (United States)
Ji-Soo Kim, Lam Research Corp. (United States)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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