
Proceedings Paper
100% reflectivity from a monolithic dielectric microstructured surfaceFormat | Member Price | Non-Member Price |
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Paper Abstract
Here, we propose a new mirror architecture which is solely based upon a monolithic dielectric micro-structured surface. Hence, the mirror device, which consists of a possibly mono-crystalline bulk material, can in principle simultaneously provide perfect reflectivity and lowest mechanical loss. By specifically structuring the monolithic surface, resulting in T-shaped ridges of a subwavelength grating, a resonant behavior of light coupling can be realized, leading to theoretically 100% reflectivity.
Paper Details
Date Published: 6 February 2008
PDF: 8 pages
Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830X (6 February 2008); doi: 10.1117/12.767775
Published in SPIE Proceedings Vol. 6883:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)
PDF: 8 pages
Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830X (6 February 2008); doi: 10.1117/12.767775
Show Author Affiliations
Frank Brückner, Friedrich-Schiller-Univ. Jena (Germany)
Tina Clausnitzer, Friedrich-Schiller-Univ. Jena (Germany)
Oliver Burmeister, Leibniz Univ. Hannover (Germany)
Daniel Friedrich, Leibniz Univ. Hannover (Germany)
Tina Clausnitzer, Friedrich-Schiller-Univ. Jena (Germany)
Oliver Burmeister, Leibniz Univ. Hannover (Germany)
Daniel Friedrich, Leibniz Univ. Hannover (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Karsten Danzmann, Leibniz Univ. Hannover (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. Jena (Germany)
Roman Schnabel, Leibniz Univ. Hannover (Germany)
Karsten Danzmann, Leibniz Univ. Hannover (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. Jena (Germany)
Roman Schnabel, Leibniz Univ. Hannover (Germany)
Published in SPIE Proceedings Vol. 6883:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)
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