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Proceedings Paper

Patterning of inorganic polymer glass waveguiding films by dry etching
Author(s): S. J. Madden; M. Zhang; B. Luther-Davies; R. Charters
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Paper Abstract

Polymer waveguides have long been of interest for low cost integrated optical devices. Inorganic Polymer glasses are a class of materials based around polysiloxanes which have many attractive features for low cost integrated optics and meet the stringent reliability requirements for deployment in carrier networks. The inorganic polymer glasses available for this work are normally patterned as negative photoresists but this leads to a resolution limit on the achievable feature size due to free radical diffusion. Therefore we demonstrate here high quality dry etching of these materials using standard photoresist masking and the fabrication of small high index contrast waveguides with losses marginally higher than the intrinsic materials losses.

Paper Details

Date Published: 8 January 2008
PDF: 7 pages
Proc. SPIE 6801, Photonics: Design, Technology, and Packaging III, 680107 (8 January 2008); doi: 10.1117/12.760843
Show Author Affiliations
S. J. Madden, Australian National Univ. (Australia)
M. Zhang, Australian National Univ. (Australia)
B. Luther-Davies, Australian National Univ. (Australia)
R. Charters, Australian National Univ. (Australia)

Published in SPIE Proceedings Vol. 6801:
Photonics: Design, Technology, and Packaging III
Wieslaw Z. Krolikowski; Costas M. Soukoulis; Ping Koy Lam; Timothy J. Davis; Shanhui Fan; Yuri S. Kivshar, Editor(s)

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