Submicrometer channel and rib waveguides based on SOI (Silicon-On-Insulator) have been designed and fabricated with electron-beam lithography and inductively coupled plasma dry etching. Propagation loss of 8.39dB/mm was measured using the cut-back method. Based on these so-called nanowire waveguides, we have also demonstrated some functional components with small dimensions, including sharp 90° bends with radius of a few micrometers, T-branches, directional couplers and multimode interferometer couplers.

Date Published: 8 January 2008
PDF: 9 pages
Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68380L (8 January 2008); doi: 10.1117/12.760224

Published in SPIE Proceedings Vol. 6838:
Optoelectronic Devices and Integration II
Xuping Zhang; Hai Ming; Maggie Yihong Chen, Editor(s)