Proceedings Paper
Realization of SOI submicrometer optical waveguide components| Format | Member Price | Non-Member Price |
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Paper Abstract
Submicrometer channel and rib waveguides based on SOI (Silicon-On-Insulator) have been designed and fabricated with
electron-beam lithography and inductively coupled plasma dry etching. Propagation loss of 8.39dB/mm was measured
using the cut-back method. Based on these so-called nanowire waveguides, we have also demonstrated some functional
components with small dimensions, including sharp 90° bends with radius of a few micrometers, T-branches, directional
couplers and multimode interferometer couplers.
Paper Details
Date Published: 8 January 2008
PDF: 9 pages
Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68380L (8 January 2008); doi: 10.1117/12.760224
Published in SPIE Proceedings Vol. 6838:
Optoelectronic Devices and Integration II
Xuping Zhang; Hai Ming; Maggie Yihong Chen, Editor(s)
PDF: 9 pages
Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68380L (8 January 2008); doi: 10.1117/12.760224
Show Author Affiliations
Jinzhong Yu, Institute of Semiconductors (China)
Xiaoguang Tu, Institute of Semiconductors (China)
Xiaoguang Tu, Institute of Semiconductors (China)
Published in SPIE Proceedings Vol. 6838:
Optoelectronic Devices and Integration II
Xuping Zhang; Hai Ming; Maggie Yihong Chen, Editor(s)
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