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Proceedings Paper

Advances in OPC technology and development of ZOPC tool
Author(s): Xiaolang Yan; Zheng Shi; Ye Chen; Qijun Chen
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Paper Abstract

As the most important RET (Resolution Enhancement Technology), OPC (Optical Proximity Correction) technology has been widely used in today's IC manufacturing and is still developing very fast both in its principle and its practice. In this invited paper, key techniques of OPC are classified and overviewed; progresses of OPC technology in recent years published in major SPIE symposiums are reviewed as well. Recent research results produced by Zhejiang University's team are described and reviewed with highlighting. An OPC tool suite named ZOPC, which has been designed to enable new OPC techniques to be integrated into one platform, is presented. The framework of ZOPC as well as its working scheme is demonstrated with real examples.

Paper Details

Date Published: 27 November 2007
PDF: 14 pages
Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271U (27 November 2007); doi: 10.1117/12.760169
Show Author Affiliations
Xiaolang Yan, Zhejiang Univ. (China)
Zheng Shi, Zhejiang Univ. (China)
Ye Chen, Zhejiang Univ. (China)
Qijun Chen, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 6827:
Quantum Optics, Optical Data Storage, and Advanced Microlithography
Chris A. Mack; Guangcan Guo; Guofan Jin; Song-hao Liu; Kees A. Schouhamer Immink; Jinfeng Kang; Jun-en Yao; Keiji Shono; Osamu Hirota, Editor(s)

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