Share Email Print

Proceedings Paper

Generation of phase-shift patterns in the optical far field and its applications
Author(s): Wei-Feng Hsu; Yu-Weng Chen; Yuan-Hong Su
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We introduce and compare two methods to produce the phase-shift patterns, which are widely generated in the near-field lithography, in the optical far field. The key component of the two methods is a phase-only diffractive optical element, a similar function found in the maskless lithography. The technique to produce a smaller feature size was a major improvement beyond the diffraction limit.

Paper Details

Date Published: 4 January 2008
PDF: 8 pages
Proc. SPIE 6832, Holography and Diffractive Optics III, 68320J (4 January 2008); doi: 10.1117/12.757054
Show Author Affiliations
Wei-Feng Hsu, National Taipei Univ. of Technology (Taiwan)
Yu-Weng Chen, National Tsing Hua Univ. (Taiwan)
Yuan-Hong Su, National Taipei Univ. of Technology (Taiwan)

Published in SPIE Proceedings Vol. 6832:
Holography and Diffractive Optics III
Yunlong Sheng; Dahsiung Hsu; Chongxiu Yu, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?