Share Email Print

Proceedings Paper

Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications
Author(s): Jing Wang; David Y. H. Pui; Chaolong Qi; Se-Jin Yook; Heinz Fissan; Erdem Ultanir; Ted Liang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Particle standard is important and widely used for calibration of inspection tools and process characterization and benchmarking. We have developed a method for generating and classifying monodisperse particles of different materials with a high degree of control. The airborne particles are first generated by an electrospray. Then a tandem Differential Mobility Analyzer (TDMA) system is used to obtain monodisperse particles with NIST-traceable sizes. We have also developed a clean and well-controlled method to deposit airborne particles on mask blanks or wafers. This method utilizes electrostatic approach to deposit particles evenly in a desired spot. Both the number of particles and the spot size are well controlled. We have used our system to deposit PSL, silica and gold particles ranging from 30 nm to 125 nm on 193nm and EUV mask blanks. We report the experimental results of using these particles as calibration standards and discuss the dependency of sensitivity on the types of particles and substrate surfaces.

Paper Details

Date Published: 22 March 2008
PDF: 10 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69220G (22 March 2008); doi: 10.1117/12.756741
Show Author Affiliations
Jing Wang, Univ. of Minnesota (United States)
David Y. H. Pui, Univ. of Minnesota (United States)
Chaolong Qi, Univ. of Minnesota (United States)
Se-Jin Yook, Hanyang Univ. (South Korea)
Heinz Fissan, Institute of Energy and Environmental Technology e.V. (Germany)
Erdem Ultanir, Intel Corp. (United States)
Ted Liang, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?