Share Email Print

Proceedings Paper

A classification and verification of real pattern defects with dust filtering in tape substrate inspection
Author(s): Young Jun Roh; Cheol Woo Kim; Jung Yeol Yeom; Chang Ook Jung; Dae Hwa Jeong
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Tape substrate pattern of ultra-fine pitch circuit less than 10 micrometers in pattern width, is required to be inspected through high resolution optics. In the process of picking out defects at the level of the critical dimension through image processing, however, trivial blemishes formed by dust or micro particles may be detected simultaneously. This leads to unnecessary work on the part of operators reviewing and verifying the additional detected points. To maximize the efficiency of the inspection process, we need to identify and classify the defect candidates whether it is a real pattern defect or simply a trivial blemish by dust. Since a real defect arising from under or over etching bears inherent features in shape and brightness, it can thus be discriminated from other trivial blemishes. In this article, we propose an image feature based defect classification method, where proper measures were obtained from a series of image analysis with FFT. Based on the data collected from experiments, we devised a statistic model for classification.

Paper Details

Date Published: 8 October 2007
PDF: 10 pages
Proc. SPIE 6718, Optomechatronic Computer-Vision Systems II, 67180E (8 October 2007); doi: 10.1117/12.754561
Show Author Affiliations
Young Jun Roh, LG Electronics (South Korea)
Cheol Woo Kim, LG Electronics (South Korea)
Jung Yeol Yeom, LG Electronics (South Korea)
Chang Ook Jung, LG Electronics (South Korea)
Dae Hwa Jeong, LG Electronics (South Korea)

Published in SPIE Proceedings Vol. 6718:
Optomechatronic Computer-Vision Systems II
Jonathan Kofman; Yuri Lopez de Meneses; Shun'ichi Kaneko; Claudio A. Perez; Didier Coquin, Editor(s)

© SPIE. Terms of Use
Back to Top