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Proceedings Paper

Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs
Author(s): Hiroshi Nomura; Yohko Furutono
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Paper Abstract

We have constructed a theory of polarimetry of illumination used in 193-nm lithography equipments, fabricated a polarimeter mask, and demonstrated it for a hyper-NA (numerical aperture) lithography scanner. The polarimeter mask comprises newly- developed polarizers and quarter-wave (λ/4) plates. The thin plate polarizers are made of calcite (CaCO3), and the λ/4 plates are composed of two crystalline quartz (α-SiO2) plates and two sapphire (Al2O3) plates. A light traveling through a window of the polarimeter mask reaches an image detector at the wafer level through projection optics. Whereas the polarization states of the projection optics are unknown to us, Stokes parameters of the illumination light are formulated without any influence from the projection optics.

Paper Details

Date Published: 28 November 2007
PDF: 14 pages
Proc. SPIE 6834, Optical Design and Testing III, 683408 (28 November 2007);
Show Author Affiliations
Hiroshi Nomura, Toshiba Corp. (Japan)
Yohko Furutono, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6834:
Optical Design and Testing III
Yongtian Wang; Theo T. Tschudi; Jannick P. Rolland; Kimio Tatsuno, Editor(s)

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