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Proceedings Paper

Computer calculation and simulation in confocal multi-layer optic storage
Author(s): Pinchun Kang; Jianhuan Zhang
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Paper Abstract

In this paper, a multilayer optical data storage method in which confocal microscopy is used for its optical sectioning is proposed. A confocal microscopy has the ability to collect optical sections from thick specimens, the key to the confocal approach is the use of spatial filtering (pinhole) to eliminate out-of-focus light or flare in specimens that are thicker than the plane of focus. For this reason the confocal multi-layer technology is promising as a new multi-layer optic storage method, in which when a layer has been chosen by being focused with the laser beam, the light from other layers in a certain distance-always tens of microns-will not be propagated through the pinhole and detected by a sensitive sensor. This means the information recorded in different layers can be read separately, the interference between layers is greatly suppressed. The properties of multilayer memory based on confocal microscopy are investigated on the basis of vector theory. The algorithms for calculation of field intensity in a focused laser spot and focused beam propagation through multilayer structure have been elaborated. The developed algorithms are applied for investigation of properties for multilayer recording based on confocal microscopy. The numerical simulation of optical properties of a multilayer optical data storage system with three layers has been shown in the paper. We used pits and bumps to record information. The results of the experiment and the conclusion are obtained finally.

Paper Details

Date Published: 24 January 2008
PDF: 6 pages
Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271D (24 January 2008); doi: 10.1117/12.752051
Show Author Affiliations
Pinchun Kang, XiaMen Univ. (China)
Jianhuan Zhang, XiaMen Univ. (China)

Published in SPIE Proceedings Vol. 6827:
Quantum Optics, Optical Data Storage, and Advanced Microlithography
Chris A. Mack; Guangcan Guo; Guofan Jin; Song-hao Liu; Kees A. Schouhamer Immink; Jinfeng Kang; Jun-en Yao; Keiji Shono; Osamu Hirota, Editor(s)

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