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Proceedings Paper

A practical solution to the critical problem of 193 nm reticle haze
Author(s): Oleg Kishkovich; Dave Halbmaier; Xavier Gabarre; Brian Grenon; James Lo; Andy Lam; Tom Chen
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Paper Abstract

The authors have developed and successfully implemented a practical, yet effective solution to help eliminate haze formation in the production fab. Based on a novel mechanism of haze formation described earlier, along with a thorough understanding of the reticle surface chemistry changes during the manufacturing process, the authors found an unexpectedly simple and straightforward way to prevent haze formation. This is possible regardless of the origin of the reticle, by controlling the purity of the immediate reticle environment.

Paper Details

Date Published: 30 October 2007
PDF: 11 pages
Proc. SPIE 6730, Photomask Technology 2007, 67301A (30 October 2007); doi: 10.1117/12.747511
Show Author Affiliations
Oleg Kishkovich, Entegris, Inc. (United States)
Dave Halbmaier, Entegris, Inc. (United States)
Xavier Gabarre, Entegris, Inc. (United States)
Brian Grenon, Grenon Consulting Inc. (United States)
James Lo, Entegris, Inc. (United States)
Andy Lam, Inotera Memories Inc. (United States)
Tom Chen, Inotera Memories Inc. (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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