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Proceedings Paper

Improving inspectability with KLA-Tencor TeraScan thin line de-sense
Author(s): Chunlin Chen; David Kim; Ki Hun Park; NamWook Kim; Sang Hoon Han; Jin Hyung Park; Dong Hoon Chung
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Paper Abstract

In the ever-changing semi-conductor industry, new innovations and technical advances constantly bring new challenges to fabs, mask-shops and vendors. One of such advances is an aggressive optical proximity correction (OPC) method, sub-resolution assist features (SRAF). On one hand, SRAFs bring a leap forward in resolution improvement during wafer printing; on the other hand they bring new challenges to many processes in mask making. KLA-Tencor Corp. working together with Samsung Electronics Co. developed an additional function to the current HiRes 1 detector to increase inspectability and usable sensitivity during the inspection step of the mask making process. SRAFs bring an unique challenge to the mask inspection process, which mask shops had not experienced before. SRAF by nature do not resolve on wafer and thus have a higher tolerance in the CD (critical dimension) uniformity, edge roughness and pattern defects. This new function, Thin-Line De-sense (TLD), increase the inspectability and usable sensitivity by generating different regions of sensitivity and thus will match the defect requirement on a particular photomask with SRAFs better. The value of TLD was proven in a production setting with more than 30 masks inspected, and resulted in higher sensitivity on main features and a sharp decrease in the amount of defects that needed to be classified.

Paper Details

Date Published: 16 November 2007
PDF: 6 pages
Proc. SPIE 6730, Photomask Technology 2007, 67303O (16 November 2007); doi: 10.1117/12.747180
Show Author Affiliations
Chunlin Chen, KLA-Tencor Corp. (United States)
David Kim, KLA-Tencor Corp. (United States)
Ki Hun Park, KLA-Tencor Corp. (United States)
NamWook Kim, KLA-Tencor Corp. (United States)
Sang Hoon Han, Samsung Electronics Co., Ltd. (South Korea)
Jin Hyung Park, Samsung Electronics Co., Ltd. (South Korea)
Dong Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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