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Proceedings Paper

OPC development in action for advanced technology nodes
Author(s): Anthony Chunqing Wang; Masashi Fujimoto; Paul J. M. van Adrichem; Ingo Bork; Hiroshi Yamashita
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Paper Abstract

In leading edge technologies, Optical Proximity Correction (OPC) plays a critical role in the total imaging flow. Large investments in terms of time and engineering resources are made to obtain the required models and recipes to get the OPC job done. In the model building area, the metrology component is becoming more and more critical. Questions like which structures to put in a calibration pattern, how to measure, where to measure them, and how often has a serious impact on the calibration dataset, and thus on the final model. Corner rounding starts to become an increasingly important factor in imaging and device performance. Because of this, the model 2D behavior needs to be verified as the least, using reliable metric. In this paper two techniques are described. Finally the cost of model building is discussed. When the number of measurements for a model calibration is considered, available machine time almost always plays a key role. In this paper, a slightly different approach is made on this problem by looking at the cost of the different components of model calibration, and how that is going to progress in the process generations to come.

Paper Details

Date Published: 31 October 2007
PDF: 5 pages
Proc. SPIE 6730, Photomask Technology 2007, 673059 (31 October 2007); doi: 10.1117/12.746838
Show Author Affiliations
Anthony Chunqing Wang, Synopsys, Inc. (United States)
Masashi Fujimoto, NEC Electronics Corp. (Japan)
Paul J. M. van Adrichem, Synopsys, Inc. (United States)
Ingo Bork, Synopsys, Inc. (United States)
Hiroshi Yamashita, NEC Electronics Corp. (Japan)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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