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Proceedings Paper

Reconfigurable lithographic applications using polymer liquid crystal composite films
Author(s): Anna E. Fox; Adam K. Fontecchio
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Paper Abstract

The proposed application of holographically formed polymer dispersed liquid crystal (H-PDLC) thin films is a real-time dynamically reconfigurable mask for the resist exposure step in the photolithographic process. H-PDLC films, or thin periodic nanostructures of alternating layers of polymer and liquid crystal have unique electro-optic properties including the ability to modulate a particular wavelength as a function of bias applied to the film. The H-PDLC photomask device consists of patterned electrodes that form pixels with independent bias control over each segment. This is achieved by etching the optically clear yet electrically conductive indium-tin-oxide electrodes on the glass confining the H-PDLC film. This mask has been used to cure Shipley 1800 series positive photoresist at its peak sensitivity wavelength of 440 nm. Structures formed using the H-PDLC photomask device have been compared to similar structures formed with a static photomask using an optical profilometer. Near vertical walls have been achieved using the H-PDLC photomask for structures with line width of 260 μm, and more narrow structures have been fabricated with resolution nearing 100 μm. Line width between structures formed using the H-PDLC mask and static photomask differ by less than 15%. Additionally, morphology studies have been performed on developed regions of glass and resist formed using a static and an H-PDLC mask to demonstrate that no structural defects exist due to formation under an H-PDLC grating.

Paper Details

Date Published: 1 November 2007
PDF: 10 pages
Proc. SPIE 6730, Photomask Technology 2007, 673048 (1 November 2007); doi: 10.1117/12.746740
Show Author Affiliations
Anna E. Fox, Drexel Univ. (United States)
Adam K. Fontecchio, Drexel Univ. (United States)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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