Proceedings Paper
Performance comparison of techniques for intra-field CD control improvement| Format | Member Price | Non-Member Price |
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Paper Abstract
Intra-field CD variation is a main contributor to the total CD variation budget in IC manufacturing. It is essentially
caused by mask CD variations and imperfections of the exposure tool. Techniques to reduce the IF CD error will be
introduced. Tool and mask based CDU improvement techniques will be compared. Their CDU improvement potential
and their correction accuracy will be analyzed. The correction methodology will be discussed, specifically none-wafer
based CD measurement techniques as correction data input. Implementation efforts of the techniques will be compared.
Paper Details
Date Published: 30 October 2007
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 673032 (30 October 2007); doi: 10.1117/12.746695
Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 673032 (30 October 2007); doi: 10.1117/12.746695
Show Author Affiliations
Rainer Pforr, Qimonda Dresden GmbH and Co. OHG (Germany)
Mario Hennig, Qimonda Dresden GmbH and Co. OHG (Germany)
Jens Reichelt, Qimonda Dresden GmbH and Co. OHG (Germany)
Mario Hennig, Qimonda Dresden GmbH and Co. OHG (Germany)
Jens Reichelt, Qimonda Dresden GmbH and Co. OHG (Germany)
Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)
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