
Proceedings Paper
2D measurement using CD SEM for arbitrarily shaped patternsFormat | Member Price | Non-Member Price |
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Paper Abstract
As the design rule of lithography becomes smaller, accuracy and precision in Critical Dimension (CD) and
controllability of pattern-shape are required in semiconductor production. Critical Dimension Scanning Electron
Microscope (CD SEM) is an essential tool to confirm the quality of the mask such as CD control, CD uniformity and CD
mean to target (MTT). Unfortunately, in the case of extremely rounded region of arbitrary enclosed patterns, CD
fluctuation depending on Region of Interest (ROI) is very serious problem in Mask CD control, so that it decreases the
yield. In order to overcome this situation, we have been developing 2-dimensonal (2D) method with system makers and
comparing CD performance between mask and wafer using enclosed arbitrary patterns. In this paper, we summarized the
results of our evaluation that compare error budget between 1-dimensonal (1D) and 2D data using CD SEM and other
optical metrology systems.
Paper Details
Date Published: 30 October 2007
PDF: 8 pages
Proc. SPIE 6730, Photomask Technology 2007, 673037 (30 October 2007); doi: 10.1117/12.746453
Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)
PDF: 8 pages
Proc. SPIE 6730, Photomask Technology 2007, 673037 (30 October 2007); doi: 10.1117/12.746453
Show Author Affiliations
Hyung-Joo Lee, Samsung Electronics Co., Ltd. (South Korea)
So-Yoon Bae, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
HanKu Cho, Samsung Electronics Co., Ltd. (South Korea)
So-Yoon Bae, Samsung Electronics Co., Ltd. (South Korea)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (South Korea)
HanKu Cho, Samsung Electronics Co., Ltd. (South Korea)
Jun Matsumoto, Advantest Corp. (Japan)
Takayuki Nakamura, Advantest Corp. (Japan)
Dong Il Shin, Vistec Semiconductor Systems Pte. Ltd. (South Korea)
TaeJun Kim, Vistec Semiconductor Systems Pte. Ltd. (South Korea)
Takayuki Nakamura, Advantest Corp. (Japan)
Dong Il Shin, Vistec Semiconductor Systems Pte. Ltd. (South Korea)
TaeJun Kim, Vistec Semiconductor Systems Pte. Ltd. (South Korea)
Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)
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