Proceedings Paper
Optical encoder measurement technology| Format | Member Price | Non-Member Price |
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Paper Abstract
A new approach to metrology for the range below 100 nm is based on large fiducial grids optical encoders produced by
interference / lithography. Since the encoder can only be as accurate as the grating scale, advance in this area depends
on the availability of encoder plates of nanometer accuracy. Various commercially available or home made holographic
gratings were checked using interferometric methods and compared with the AFM device results. The budget of errors
was analyzed and the necessary improvements of measuring technology are presented.
Paper Details
Date Published: 7 May 2007
PDF: 6 pages
Proc. SPIE 6635, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III, 663506 (7 May 2007); doi: 10.1117/12.741862
Published in SPIE Proceedings Vol. 6635:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III
Ovidiu Iancu; Adrian Manea; Paul Schiopu, Editor(s)
PDF: 6 pages
Proc. SPIE 6635, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III, 663506 (7 May 2007); doi: 10.1117/12.741862
Show Author Affiliations
Iuliana Iordache, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Mihaela Bojan, National Institute for Lasers, Plasma and Radiation Physics (Romania)
D. Apostol, National Institute for Lasers, Plasma and Radiation Physics (Romania)
V. Damian, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Mihaela Bojan, National Institute for Lasers, Plasma and Radiation Physics (Romania)
D. Apostol, National Institute for Lasers, Plasma and Radiation Physics (Romania)
V. Damian, National Institute for Lasers, Plasma and Radiation Physics (Romania)
F. Garoi, National Institute for Lasers, Plasma and Radiation Physics (Romania)
P. C. Logofatu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Raluca Muller, National Institute in Microtechnologies (Romania)
B. Savu, Univ. Politehnica of Bucharest (Romania)
P. C. Logofatu, National Institute for Lasers, Plasma and Radiation Physics (Romania)
Raluca Muller, National Institute in Microtechnologies (Romania)
B. Savu, Univ. Politehnica of Bucharest (Romania)
Published in SPIE Proceedings Vol. 6635:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies III
Ovidiu Iancu; Adrian Manea; Paul Schiopu, Editor(s)
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