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Proceedings Paper

Hybrid nanoimprint for micro-nano mixture structure
Author(s): Keisuke Okuda; Naoyuki Niimi; Hiroaki Kawata; Yoshihiko Hirai
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Paper Abstract

Hybrid patterning by thermal and UV nanoimprint lithography is newly proposed to fabricate micro-nano mixture structures. The SU-8 resist is thermally imprinted using the quartz mold, which has fine nano structures and micro Cr blank patterns. After the thermal nanoimprint, UV is exposed keeping the mold on the resist through the mold. Then, the mold is detached and the resist is developed to fabricate micro structures. Using this process, micro gratings having 40 μm in width and 20 μm in depth nano dots pattern, which has 200 nm feature size is successfully demonstrated.

Paper Details

Date Published: 3 May 2007
PDF: 6 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330R (3 May 2007); doi: 10.1117/12.736928
Show Author Affiliations
Keisuke Okuda, Osaka Prefecture Univ. (Japan)
Naoyuki Niimi, Osaka Prefecture Univ. (Japan)
Hiroaki Kawata, Osaka Prefecture Univ. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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