Share Email Print

Proceedings Paper

Aerial imaging performance of ALTA4700 printed mask for 130nm design rule
Author(s): Jyh Wei Hsu; Chun Hung Wu; Kevin Cheng
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Photomask plays a key role in optical lithography. Laser pattern generators are widely used for photomask manufacturing due to their high throughput. However, corner rounding and line-end shortening degrade pattern fidelity resulting in distorted pattern image s on wafer. ALTA 4700 incorporates a new 0.9 NA, 42X reduction lens that significantly improves resolution and pattern accuracy performance. In this study, three critical line/space 130nm technology device patterns are printed by ALTA4700 laser pattern generator. Input data for these layers was based on existing OPC model generated for e-beam pattern generator. ALTA4700 printed masks have the same aerial image performance compare with e-beam pattern generator.

Paper Details

Date Published: 3 May 2007
PDF: 10 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331A (3 May 2007); doi: 10.1117/12.736524
Show Author Affiliations
Jyh Wei Hsu, Taiwan Mask Corp. (Taiwan)
Chun Hung Wu, Taiwan Mask Corp. (Taiwan)
Kevin Cheng, Taiwan Mask Corp. (Taiwan)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?