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Proceedings Paper

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
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Paper Abstract

Extremely high surface figure accuracy is required for hard x-ray nanofocusing mirrors to realize an ideal spherical wavefront in a reflected x-ray beam. We performed the figure correction of an elliptically figured mirror by a differential deposition technique on the basis of the wavefront phase error, which was calculated by a phase-retrieval method using only intensity profile on the focal plane. The measurements of the intensity profiles were performed at the 1-km-long beamline at SPring-8. The two measurements before and after the figure correction indicate that the beamwaist structure around the focal point is greatly improved.

Paper Details

Date Published: 1 October 2007
PDF: 8 pages
Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670404 (1 October 2007);
Show Author Affiliations
Soichiro Handa, Osaka Univ. (Japan)
Hidekazu Mimura, Osaka Univ. (Japan)
Satoshi Matsuyama, Osaka Univ. (Japan)
Hirokatsu Yumoto, Osaka Univ. (Japan)
SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Takashi Kimura, Osaka Univ. (Japan)
Yasuhisa Sano, Osaka Univ. (Japan)
Kenji Tamasaku, SPring-8/RIKEN (Japan)
Yoshinori Nishino, SPring-8/RIKEN (Japan)
Makina Yabashi, SPring-8/Japan Synchrotron Radiation Research Institute (Japan)
Tetsuya Ishikawa, SPring-8/RIKEN (Japan)
Kazuto Yamauchi, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 6704:
Advances in Metrology for X-Ray and EUV Optics II
Lahsen Assoufid; Peter Z. Takacs; Masaru Ohtsuka, Editor(s)

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