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Proceedings Paper

Mask industry assessment trend analysis 2006
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Paper Abstract

Microelectronics industry leaders routinely name the cost and cycle time of mask technology and mask supply as top critical issues. A survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. This year's survey data was presented at BACUS and a detailed trend analysis is presented here. The annual survey is designed with the input of semiconductor company mask technologists, merchant mask suppliers and industry equipment makers. This year's assessment is the fifth in the current series of annual reports. With continued industry support the report can be used as a baseline to gain perspective on the technical and business status of the mask and microelectronics industries. The report will continue to serve as a valuable reference to identify trends in the mask industry. The results will be used to guide future investments on critical path issues. This year's survey is basically the same as the 2005 survey. Questions are grouped into categories: General Business Profile Information, Data Processing, Yields and Yield Loss, Mechanisms, Delivery Times, Returns and Services, Operating Cost Factors, and Equipment Utilization. Within each category is a multitude of questions that create a detailed profile of both the business and technical status of the critical mask industry. Note: the questions covering operating cost factors and equipment utilization were only added to the survey in 2005; therefore meaningful trend analysis is not yet available.

Paper Details

Date Published: 3 May 2007
PDF: 10 pages
Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 653303 (3 May 2007); doi: 10.1117/12.731817
Show Author Affiliations
Gilbert Shelden, Shelden Consulting (United States)
Patricia Marmillion, SEMATECH / IBM (United States)

Published in SPIE Proceedings Vol. 6533:
23rd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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