Share Email Print

Proceedings Paper

The role of defects in the laser desorption of ions from fused silica at 157 nm
Author(s): S. R. John; J. Lerass; S. C. Langford; J. T. Dickinson
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

At fluences well below the threshold for plasma formation, we have characterized the direct desorption of atomic ions from fused silica surfaces during 157-nm irradiation by time-resolved mass spectroscopy. The principal ions are Si+ and O+. The emission intensities are dramatically increased by treatments that increase the density of surface defects. Molecular dynamics simulations of the silica surface suggest that silicon ions bound at surface oxygen vacancies (analogous to E' centers) provide suitable configurations for the emission of Si+. We propose that emission is best understood in terms of a hybrid mechanism involving both antibonding chemical forces (Menzel- Gomer-Redhead model) and repulsive electrostatic forces on the adsorbed ion after laser excitation of the underlying defect.

Paper Details

Date Published: 25 April 2007
PDF: 10 pages
Proc. SPIE 6606, Advanced Laser Technologies 2006, 66060P (25 April 2007); doi: 10.1117/12.729592
Show Author Affiliations
S. R. John, Washington State Univ. (United States)
J. Lerass, Washington State Univ. (United States)
S. C. Langford, Washington State Univ. (United States)
J. T. Dickinson, Washington State Univ. (United States)

Published in SPIE Proceedings Vol. 6606:
Advanced Laser Technologies 2006
Dan C. Dumitras; Maria Dinescu; Vitally I. Konov, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?