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Proceedings Paper

Reduction of resist heating effect by writing order optimization: part II
Author(s): Kazuya Goto; Kazutaka Watakabe; Tadashi Komagata; Yasutoshi Nakagawa
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Paper Abstract

This paper presents an experimental study of resist heating effect in mask making with a variable shaped electron beam mask writer. Experiments were performed at current densities of 40 and 80 A/cm2 on mask blanks with a chemically amplified resist. At these levels of current density, the critical dimension change due to resist heating effect was obvious. The critical dimension change was reduced with a checkerwise writing method, in which sub-fields were arranged in main fields in an alternate fashion so that the average incoming heat per unit area due to beam exposure could be reduced. The reduction factor was 2 or more.

Paper Details

Date Published: 14 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660721 (14 May 2007);
Show Author Affiliations
Kazuya Goto, JEOL Ltd. (Japan)
Kazutaka Watakabe, JEOL Ltd. (Japan)
Tadashi Komagata, JEOL USA Inc. (United States)
Yasutoshi Nakagawa, JEOL Ltd. (Japan)

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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