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Proceedings Paper

Step and flash imprint lithography template fabrication for emerging market applications
Author(s): Douglas J. Resnick; Gerard Schmid; Mike Miller; Gary Doyle; Chris Jones; Dwayne LaBrake
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Paper Abstract

The Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.

Paper Details

Date Published: 12 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070T (12 May 2007); doi: 10.1117/12.728943
Show Author Affiliations
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
Gerard Schmid, Molecular Imprints, Inc. (United States)
Mike Miller, Molecular Imprints, Inc. (United States)
Gary Doyle, Molecular Imprints, Inc. (United States)
Chris Jones, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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