The Step and Flash Imprint Lithography (S-FIL^TM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.

Date Published: 12 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070T (12 May 2007); doi: 10.1117/12.728943

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)