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Proceedings Paper

Electron-beam mask writer EBM-6000 for 45-nm HP node
Author(s): Jun Yashima; Kenji Ohtoshi; Noriaki Nakayamada; Hirohito Anze; Takehiko Katsumata; Tomohiro Iijima; Rieko Nishimura; Syuuichiro Fukutome; Nobuo Miyamoto; Seiji Wake; Yusuke Sakai; Shinji Sakamoto; Shigehiro Hara; Hitoshi Higurashi; Kiyoshi Hattori; Kenichi Saito; Rodney Kendall; Shuichi Tamamushi
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Paper Abstract

In order to comply with the demanding technology requirements for 45 nm half pitch (HP) node (32 nm technology node), Nuflare Technology Inc. (NFT) has developed Electron-beam mask writing equipment, EBM-6000, with increased current density (70A/cm2), while its other primary features basically remain unchanged, namely 50 kV acceleration voltage, Variable Shaped Beam (VSB)/vector scan, like its predecessors [1-5]. In addition, new functionalities and capabilities such as astigmatism correction in subfield, optimized variable stage speed control, electron gun with multiple cathodes (Turret electron gun), and optimized data handling system have been employed to improve writing accuracy, throughput, and up-time. VSB-12 is the standard input data format for EBM-6000, and as optional features to be selected by users, direct input function for VSB-11 and CREF-flatpoly are offered as well. In this paper, the new features and capabilities of EBM-6000 together with supporting technologies are reported to solidly prove the viability of EBM-6000 for 45 nm HP node.

Paper Details

Date Published: 11 May 2007
PDF: 8 pages
Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660703 (11 May 2007); doi: 10.1117/12.728917
Show Author Affiliations
Jun Yashima, NuFlare Technology Inc. (Japan)
Kenji Ohtoshi, NuFlare Technology Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology Inc. (Japan)
Hirohito Anze, NuFlare Technology Inc. (Japan)
Takehiko Katsumata, NuFlare Technology Inc. (Japan)
Tomohiro Iijima, NuFlare Technology Inc. (Japan)
Rieko Nishimura, NuFlare Technology Inc. (Japan)
Syuuichiro Fukutome, NuFlare Technology Inc. (Japan)
Nobuo Miyamoto, NuFlare Technology Inc. (Japan)
Seiji Wake, NuFlare Technology Inc. (Japan)
Yusuke Sakai, NuFlare Technology Inc. (Japan)
Shinji Sakamoto, NuFlare Technology Inc. (Japan)
Shigehiro Hara, NuFlare Technology Inc. (Japan)
Hitoshi Higurashi, NuFlare Technology Inc. (Japan)
Kiyoshi Hattori, NuFlare Technology Inc. (Japan)
Kenichi Saito, NuFlare Technology Inc. (Japan)
Rodney Kendall, NuFlare Technology Inc. (Japan)
Shuichi Tamamushi, NuFlare Technology Inc. (Japan)

Published in SPIE Proceedings Vol. 6607:
Photomask and Next-Generation Lithography Mask Technology XIV
Hidehiro Watanabe, Editor(s)

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