
Proceedings Paper
Rapid temperature processing (RTP) system for selenization of photovoltaic materialsFormat | Member Price | Non-Member Price |
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Paper Abstract
Rapid Temperature Processing (RTP) methodology is widely applied in thin-film photovoltaic materials technology due to high quality of fabricated cells and also perspectives for their mass manufacturing. This paper describes a RTP device structure which contains the graphite reactor for selenization of Cu/In or Cu/In/Se precursors. Strong nonlinearity of radiative energy transfer makes RTP controlling difficult so it still needs to be improved. Using mathematical model of the device, we are proposing the method of process controlling. Experimentally obtained temperature profiles of Rapid Temperature Processes are presented and compared with temperature profile of typical CIS selenization graphite reactor. Presented steering procedure, based on our model, gives improves by decreasing time needed for selenization and simultaneously reducing costs of the process.
Paper Details
Date Published: 20 October 2006
PDF: 5 pages
Proc. SPIE 6348, Optoelectronic and Electronic Sensors VI, 634808 (20 October 2006); doi: 10.1117/12.721040
Published in SPIE Proceedings Vol. 6348:
Optoelectronic and Electronic Sensors VI
Tadeusz Pisarkiewicz, Editor(s)
PDF: 5 pages
Proc. SPIE 6348, Optoelectronic and Electronic Sensors VI, 634808 (20 October 2006); doi: 10.1117/12.721040
Show Author Affiliations
Michał Warzecha, AGH Univ. of Science and Technology (Poland)
Henryk Jankowski, AGH Univ. of Science and Technology (Poland)
Lidia Maksymowicz, AGH Univ. of Science and Technology (Poland)
Henryk Jankowski, AGH Univ. of Science and Technology (Poland)
Lidia Maksymowicz, AGH Univ. of Science and Technology (Poland)
Tadeusz Pisarkiewicz, AGH Univ. of Science and Technology (Poland)
Cezary Worek, AGH Univ. of Science and Technology (Poland)
Cezary Worek, AGH Univ. of Science and Technology (Poland)
Published in SPIE Proceedings Vol. 6348:
Optoelectronic and Electronic Sensors VI
Tadeusz Pisarkiewicz, Editor(s)
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