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Proceedings Paper

Method of matrix alignment for nanostructure lithography
Author(s): Andre Sokolnikov
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Paper Abstract

Nanoimprint is an emerging lithographic technology that promises high-throughput pattering of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffraction or beam scattering in other conventional techniques. The difficulty arises with the exact 900 setting of the mould above the wafer. Proposed is the method of achieving this perpendicularity by the means of the crystallographic properties of Si or GaAs and the matrix made of the above-mentioned materials.

Paper Details

Date Published: 3 May 2007
PDF: 6 pages
Proc. SPIE 6556, Micro (MEMS) and Nanotechnologies for Defense and Security, 65560V (3 May 2007); doi: 10.1117/12.720131
Show Author Affiliations
Andre Sokolnikov, Visual Solutions and Applications (United States)

Published in SPIE Proceedings Vol. 6556:
Micro (MEMS) and Nanotechnologies for Defense and Security
Thomas George; Zhongyang Cheng, Editor(s)

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