
Proceedings Paper
Critical dimension: MEMS road mapFormat | Member Price | Non-Member Price |
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Paper Abstract
The use of Micro-Electro-Mechanical Systems (MEMS) technology in mechanical, biotechnology, optical,
communications, and ink jet is growing. Critical dimensions in MEMS devices are getting smaller and
processes are constantly facing new metrology challenges. This paper will examine some critical dimension
metrology needs and challenges for MEMS using resist-on-silicon structures. It is shown that the use of
automated optical CD metrology can meet emerging measurement requirements while bringing the
advantages of a non-destructive, high throughput and precise methodology.
Paper Details
Date Published: 5 April 2007
PDF: 6 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184W (5 April 2007); doi: 10.1117/12.716690
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
PDF: 6 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184W (5 April 2007); doi: 10.1117/12.716690
Show Author Affiliations
Marc Poulingue, Nanometrics France (France)
Paul Knutrud, Nanometrics (United States)
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
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