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Proceedings Paper

Study on diazonaphthoquinone positive photoresist composition for LCD
Author(s): Fangyu Zhou; Yingquan Zou; Zhanbin Zhang
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Paper Abstract

We report on a study of the diazonaphthoquinone (DNQ) positive photoresist composition for LCD. Photoresist is the important material used for the electrode of LCD. LCD photoresist consists of photoactive compounds, binder resin and organic solvent. We first study the esterification of 3,4,5-trihydroxybenzophenone, 2,2',4,4'-tetrahydroxybenzophenone and 1,2-DNQ-4-or-5-sulfonylchloride, then the conventional photoactive compounds were synthesized. The properties of the conventional photoresist composition were also studied. Our work focuses on exploring new type of photoactive compounds. We prepared the new phenol compounds: 7,8-dihydroxy-4-methylcoumarin, 6,7-dihydroxy-3,3-diphenyl-3H-benzenefuran-2- ketone, and then reacted with 1,2-DNQ-4-or-5-sulfonyl chloride. The new photoactive compounds were used with PGMEA as organic solvent and the novolac resin as binder resin, then the photoresist composition was prepared. The photoresist composition was coated on the pretreated ITO films and ITO glasses. After the prebake, exposure, developing, hard bake, a desired pattern was produced . The properties of photoresist composition, for example: photosensitivity, resolution and developing performance were good, and the photosensitivity can reach to, the resolution can be 1&mgr;m.

Paper Details

Date Published: 9 April 2007
PDF: 9 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65194C (9 April 2007); doi: 10.1117/12.714323
Show Author Affiliations
Fangyu Zhou, Beijing Normal Univ. (China)
Yingquan Zou, Beijing Normal Univ. (China)
Zhanbin Zhang, Beijing Normal Univ. (China)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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