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Proceedings Paper

Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra
Author(s): Mark Smith; Joseph Bendik; Ivan Lalovic; Nigel Farrar; William Howard; Chris Sallee
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Paper Abstract

The combined impact of longitudinal chromatic aberrations, focus-drilling, and Z-noise on several lithographic performance metrics is described. After review, we investigate an improved method for simulating the lithographic behavior of longitudinal chromatic aberrations stemming from the finite bandwidth of excimer laser pulse-spectra using PROLITHTM v. 9.3.3. Additionally, we explore two methods for modeling the lithographic improvements related to focus-drilling and new PROLITH functionality for modeling the effects of Z-noise. Our case studies involve reinvestigating the RELAX process and providing a framework for accurate lithographic simulation using machine specific pulse-spectral data, modified Lorentzian, and Gaussian models. After presentation and analysis, we discuss potential applications including methods for improved focus budgets and improved mask design.

Paper Details

Date Published: 27 March 2007
PDF: 8 pages
Proc. SPIE 6520, Optical Microlithography XX, 65203E (27 March 2007); doi: 10.1117/12.714102
Show Author Affiliations
Mark Smith, KLA-Tencor Corp. (United States)
Joseph Bendik, Dynamic Intelligence Inc. (United States)
Ivan Lalovic, Cymer, Inc. (United States)
Nigel Farrar, Cymer, Inc. (United States)
William Howard, KLA-Tencor Corp. (United States)
Chris Sallee, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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