This paper proposes an evaluation pattern generating method that realizes stable printing for any two-dimensional feature. Below 65nm design node, even in the case of using the most advanced optical techniques, the resolution limit is approached. As a result, patterning fidelity to the target worsens in low k₁ lithography conditions. Complex layout patterns, especially two-dimensional features, become increasingly sensitive to photo-resist bridging and necking. This means that the need for rich two-dimensional patterns is increasing in order to cope with lithographic patterning fidelity issues, such as quality assurance of OPC script and establishment of the design rule. A new pattern generating method reported in this paper can provide plenty of unexpected two-dimensional patterns by employing the Monte Carlo method. It can also take the design rule checker into account to present patterns without any design rule violation. In addition, to narrow significant patterns down to real efficient patterns, we employ a device that generates the characteristic features of each layer. More than 2000 feature variations of feature can be generated in less than half day by this new method and verifying OPC with the generated 2000 patterns is estimated to be equal to verifying OPC with all pattern variations that appear in 10 real products. More examples are provided to verify the efficacy of two-dimensional patterns generated by this approach. It is shown that the proposed method is significantly efficient for detecting hotspots that are unfaithful to the target with low k₁ factor.

Date Published: 21 March 2007
PDF: 10 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65211B (21 March 2007); doi: 10.1117/12.713604

Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)