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Proceedings Paper

MacroCD contact ellipticity measurements for lithography tool qualification
Author(s): Ilan Englard; Eelco van Setten; Gert-Jan Janssen; Peter Vanoppen; Ingrid Minnaert-Janssen; Frank Duray; Ofer Adan; Amit Moran; Liraz Gershtein; Ram Peltinov
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Paper Abstract

Contact hole integrity is an important metric for IC manufacturers, which is reflected in tight ellipticity control as part of the lithography tool qualifications. The current ellipticity measurement methodology is very sensitive to random process variations of the contact hole shape. Determining ellipticity in a systematic manner poses a challenge on qualification productivity, as acquiring more data for statistical validity leads to unacceptably long measurement times. The introduction of the so-called MacroCD Vector measurement enables a single shot large sampling of contact holes, including vector calculation and averaging of all individual contact ellipticity results within the MacroCD measurement array. Based on these enhanced measurement features, it is shown that contact hole ellipticity can be determined with much higher accuracy while local, mostly process induced variations can be characterized simultaneously. This opens possibilities to study correlation between ellipticity and possible root causes in the litho process module.

Paper Details

Date Published: 5 April 2007
PDF: 11 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651837 (5 April 2007); doi: 10.1117/12.713469
Show Author Affiliations
Ilan Englard, Applied Materials Europe (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Gert-Jan Janssen, ASML Netherlands B.V. (Netherlands)
Peter Vanoppen, ASML Netherlands B.V. (Netherlands)
Ingrid Minnaert-Janssen, ASML Netherlands B.V. (Netherlands)
Frank Duray, ASML Netherlands B.V. (Netherlands)
Ofer Adan, Applied Materials Europe (Israel)
Amit Moran, Applied Materials Europe (Israel)
Liraz Gershtein, Applied Materials Europe (Israel)
Ram Peltinov, Applied Materials Europe (Israel)

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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