Share Email Print

Proceedings Paper

The accuracy of a calibrated PROLITH physical resist model across illumination conditions
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In this paper, the portability of a calibrated PROLITH resist model outside of the exposure conditions used during its generation is tested. Can a single physical resist model accurately predict results of different illumination schemes without recalibration at each condition? Can a calibrated physical resist model accurately describe observed lithographic behaviors outside the conditions used to create it? PROLITH model accuracy in predicting verification data exposed at conditions different from the calibration condition is shown to be 1 nm RMS across dose, focus and mask pitch.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65211I (21 March 2007); doi: 10.1117/12.712862
Show Author Affiliations
John J. Biafore, KLA-Tencor Corp. (United States)
Stewart A. Robertson, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)
Chris Sallee, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?