
Proceedings Paper
Optimized molecular contamination monitoring for lithographyFormat | Member Price | Non-Member Price |
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Paper Abstract
A new approach to monitoring molecular contamination in lithography is presented. Recent technical advances have
made it feasible to perform continuous real-time monitoring with significant advances in sensitivity and stability while
minimizing sample tubing effects. These improvements are realized by using a small, low-cost monitor that is dedicated
to monitoring a single location. A dedicated, point-of-use monitor offers the following advantages over a conventional
multipoint sampling system: continuous monitoring, no missed contamination events, sample tubing lengths reduced
from 20 - 30 meters to 2 - 3 meters, and 5 - 10x better sensitivity. Improvements in sensitivity and stability are realized
through a dedicated monitor approach to molecular contamination monitoring. Because the monitor is continuously
sampling the same environment, sample averaging can be used in a highly effective manner to reduce the detection limit.
This is particularly useful in chemically filtered environments where the concentrations are usually low and stable. An
automated monitoring software package can simultaneously plot individual one minute data points and a long-term
running average. The one minute samples are used to immediately detect the onset of a contamination event while the
long term running average is used to monitor background contamination at the lowest levels.
Paper Details
Date Published: 5 April 2007
PDF: 10 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651844 (5 April 2007); doi: 10.1117/12.712315
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
PDF: 10 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651844 (5 April 2007); doi: 10.1117/12.712315
Show Author Affiliations
D. Rodier, Particle Measuring Systems (United States)
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
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