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Proceedings Paper

New filter media development for effective control of trimethysilanol (TMS) and related low molecular weight silicon containing organic species in the photobay ambient
Author(s): Anatoly Grayfer; Frank V. Belanger; Phillip Cate; David Ruede
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Paper Abstract

The authors present results of extensive studies on the chemical behavior of low molecular weight silicon-containing species (LMWS) and associated challenges of their analytical determination and control to prevent adverse influence on critical optical elements of exposure tools. In their paper the authors describe a non-traditional approach to the creation of a TMS gaseous source for filter media development and an engineering solution to the challenge of controlling LMWS - a solution that shows a significant advantage over currently existing approaches.

Paper Details

Date Published: 5 April 2007
PDF: 11 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651842 (5 April 2007); doi: 10.1117/12.712208
Show Author Affiliations
Anatoly Grayfer, Entegris Inc. (United States)
Frank V. Belanger, Entegris Inc. (United States)
Phillip Cate, Entegris Inc. (United States)
David Ruede, Entegris Inc. (United States)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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