
Proceedings Paper
Development of top coat materials for ArF immersion lithographyFormat | Member Price | Non-Member Price |
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Paper Abstract
We have investigated higher hydrophobic developer-soluble topcoat by combination of developer-soluble unit with
higher hydrophobic unit. We have already reported a series of fluoropolymers, FUGU having a partially fluorinated
monocyclic structure and having acidic hydroxyl group which act as dissolution unit into alkaline solution. In
addition, recently we have developed new series of highly fluorinated monomers which was expected to act as
hydrophobic unit. In this paper, we describe results of co-polymersization of FUGU with these hydrophobic monomers
and evaluation of them. Some of them showed good hydrophobicity keeping moderate developer solubility.
Furthermore, we found that higher hydrophobic developer-soluble materials were achieved by adding small amount
of highly hydrophobic polymer to developer-soluble polymer, for example FUGU, and in fact this type of blending
polymer showed high hydrophobicity keeping high dissolution. We have obtained various kind of new type of topcoat
materials whose receding angle varied from 70-90 degree and patterning profile without dissolution residue could be
obtained by using two beam interference.
Paper Details
Date Published: 2 April 2007
PDF: 9 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191Y (2 April 2007); doi: 10.1117/12.711867
Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)
PDF: 9 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191Y (2 April 2007); doi: 10.1117/12.711867
Show Author Affiliations
Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)
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