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Proceedings Paper

Stage position measurement for e-beam lithography tool
Author(s): Paul G. Harris; William Lee; Andrew W. McClelland; John M. Tingay
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Paper Abstract

With an evident requirement for Gaussian electron beam direct write lithography for prototyping and development on 300mm substrates below the 32nm node Vistec Lithography began the development of a new tool. A key requirement of this tool development was the integration and use of an interferometry solution for stage position measurement. Existing products had shown limitations in their practical application and performance and a new solution sought by the design team. Vistec entered into a development programme with Renishaw to utilise their newly developed interferometry systems.

Paper Details

Date Published: 15 March 2007
PDF: 10 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651710 (15 March 2007); doi: 10.1117/12.711452
Show Author Affiliations
Paul G. Harris, Vistec Lithography Ltd. (United Kingdom)
William Lee, Renishaw plc (United Kingdom)
Andrew W. McClelland, Vistec Lithography Ltd. (United Kingdom)
John M. Tingay, Vistec Lithography Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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