The spectroscopic Mueller polarimetry in conical diffraction was applied for the metrological characterization of the one-dimensional (1D) holographic gratings, used for the fabrication of nanoimprint molding tool. First we characterized the master grating that consists of patterned resist layer on chromium-covered glass and then we studied replicated diffraction grating made of nickel. The experimental spectra of Mueller matrix of both samples taken at different azimuthal angles were fitted with symmetric trapezoidal model. The optimal values of gratings critical dimensions (CDs) and height were confirmed by atomic force microscopy (AFM) measurements. The calculated profiles of corresponding master and replica gratings are found to be complementary. We showed that Mueller polarimetry in conical diffraction, as a fast and non-contact optical characterization technique, can provide the basis for the metrology of the molding tool fabrication step in the nanoimprint technique.

Date Published: 5 April 2007
PDF: 10 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65184E (5 April 2007); doi: 10.1117/12.711401

Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)