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Proceedings Paper

Investigation of DFM-lite ORC approach during OPC simulation
Author(s): Chin Teong Lim; Kai Peter; Vlad Temchenko; Dave Wallis; Dieter Kaiser; Ingo Meusel; Sebastian Schmidt; Martin Niehoff
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Paper Abstract

In the recent year tools for DFM (Design for Manufacturing) addressing the lithographic pattern transfer like LfD have evolved besides OPC (Optical Proximity Correction) to reduce the time required from design to manufacturing along the design to mask data preparation flow. The insertion of ORC (Optical Rule Check) after OPC in a separate mask data preparation step has been commonly adopted in order to successfully meet the ever increasing need of an advanced technology node like 130nm, 90nm, 65nm and below. Separate simulation runs are normally done for both OPC and ORC and it is not unusual that different platforms (software, hardware or algorithm) are used for OPC and ORC, especially for better ORC processing throughput. An investigation has been made to look into the possibility of a DFMlite approach by inserting ORC into the OPC run on the same Calibre platform. This is accomplished by adding additional intelligence necessary to provide a 'polishing' step for a hotspot identified, without increasing the combined cycle time but having the benefit of both full OPC and partial ORC in a single simulation run.

Paper Details

Date Published: 27 March 2007
PDF: 12 pages
Proc. SPIE 6520, Optical Microlithography XX, 65204E (27 March 2007); doi: 10.1117/12.711395
Show Author Affiliations
Chin Teong Lim, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Kai Peter, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Vlad Temchenko, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Dave Wallis, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Dieter Kaiser, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Ingo Meusel, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Sebastian Schmidt, Infineon Technologies Dresden GmbH and Co. OHG (Germany)
Martin Niehoff, Mentor Graphics Corp. (Germany)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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