Share Email Print

Proceedings Paper

Scanner parameter sensitivity analysis for OPE
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The imaging power of microlithographic lenses, normalized to minimum feature size, has become lower and lower for each generation, even with the progress of high-NA lithography. The rate of increase of NA has not kept pace with Moore's law. Therefore, low k1 lithography techniques such as RET (Resolution Enhancement Technology) have been applied for more than a decade. RET, however, is a technique to increase the imaging contrast only for dedicated pattern types/sizes, and may decrease the imaging power for other than dedicated patterns. To fill this gap between actual imaging power and required imaging power, OPC (Optical Proximity Correction) technologies are becoming more and more important for leading edge lithography. The accuracy of OPC is important for high performance quality chips. On the other hand, due to low relative imaging power and high NA of the current projection lens, imaging performance is very sensitive to various kinds of errors such as defocus, dose error, aberration, apodization, flare, polarization aberration, polarization status, etc. In order to solve this, scanner parameters, which can be obtained even before the scanner itself has been completed, should be embedded in the imaging simulation in OPC design and verification to improve the accuracy. In addition, OPE (Optical Proximity Effect) data simulated with the scanner parameters may be useful for early stage reticle design before actual exposure using first lot scanners. We have studied the sensitivity of OPE to scanner parameters and prioritized parameters to be input to the OPC design and/or verification process for improving the accuracy without significant increase in the amount of calculation.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652116 (21 March 2007); doi: 10.1117/12.711356
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Yuki Ishii, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 6521:
Design for Manufacturability through Design-Process Integration
Alfred K.K. Wong; Vivek K. Singh, Editor(s)

© SPIE. Terms of Use
Back to Top