
Proceedings Paper
Data sharing system for lithography APCFormat | Member Price | Non-Member Price |
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Paper Abstract
We have developed a simple and cost-effective data sharing system between fabs for lithography
advanced process control (APC). Lithography APC requires process flow, inter-layer information,
history information, mask information and so on. So, inter-APC data sharing system has become
necessary when lots are to be processed in multiple fabs (usually two fabs). The development cost
and maintenance cost also have to be taken into account. The system handles minimum information
necessary to make trend prediction for the lots. Three types of data have to be shared for precise
trend prediction. First one is device information of the lots, e.g., process flow of the device and
inter-layer information. Second one is mask information from mask suppliers, e.g., pattern
characteristics and pattern widths. Last one is history data of the lots. Device information is
electronic file and easy to handle. The electronic file is common between APCs and uploaded into
the database. As for mask information sharing, mask information described in common format is
obtained via Wide Area Network (WAN) from mask-vender will be stored in the mask-information
data server. This information is periodically transferred to one specific lithography-APC server and
compiled into the database. This lithography-APC server periodically delivers the mask-information
to every other lithography-APC server. Process-history data sharing system mainly consists of
function of delivering process-history data. In shipping production lots to another fab, the
product-related process-history data is delivered by the lithography-APC server from the shipping
site. We have confirmed the function and effectiveness of data sharing systems.
Paper Details
Date Published: 5 April 2007
PDF: 8 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65182S (5 April 2007); doi: 10.1117/12.711246
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
PDF: 8 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 65182S (5 April 2007); doi: 10.1117/12.711246
Show Author Affiliations
Masanori Shimabara, Fujitsu Ltd. (Japan)
Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)
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