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Proceedings Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation
Author(s): S. Matsunari; T. Aoki; K. Murakami; Y. Gomei; S. Terashima; H. Takase; M. Tanabe; Y. Watanabe; Y. Kakutani; M. Niibe; Y. Fukuda
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Paper Abstract

Organic gases cause carbon depositions on the multi-layer mirrors by Extreme Ultra Violet (EUV) light irradiations in EUV lithography tool. The dependences on organic gas species, organic gas pressure and EUV light intensity in the carbon deposition were researched in order to understand this reaction. EUV light was irradiated on a (Si/Mo) multilayer mirror sample injecting organic gas like buthane, buthanol, methyl propionate, hexane, perfluoro octane, decane, decanol, methyl nonanoate, diethyl benzene, dimethyl phthalate and hexadecane. X-ray photoelectron spectroscopy measurements revealed that organic gases with heavier molecule weight or higher boiling temperature caused faster carbon deposition rates. Carbon deposition rates increased linearly with organic gas pressures. Dependence on EUV light intensity was estimated from comparisons between an EUV light profile and carbon distributions on irradiated samples. Carbon deposition rates increased rapidly, but became saturated at higher EUV light intensities. Three chemical reactions, an adsorption, a desorption and a carbon deposition by EUV light irradiation, were taken into account to explain the behavior of the carbon deposition. Electron irradiation on a mirror sample revealed that photoelectrons emitting from the mirror surface played an important role in carbon deposition.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172X (21 March 2007); doi: 10.1117/12.710816
Show Author Affiliations
S. Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
T. Aoki, Extreme Ultraviolet Lithography System Development Association (Japan)
K. Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Y. Gomei, Canon Inc. (Japan)
S. Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
H. Takase, Extreme Ultraviolet Lithography System Development Association (Japan)
M. Tanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Y. Watanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Y. Kakutani, Univ. of Hyogo (Japan)
M. Niibe, Univ. of Hyogo (Japan)
Y. Fukuda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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